Array substrate, method of manufacturing the same and liquid crystal display apparatus having the same

ABSTRACT

An array substrate includes a transparent substrate, an organic insulation layer, a pixel electrode, a reflective layer, a light blocking pattern and a switching part. The transparent substrate includes a reflective window that reflects an ambient light and a transmissive window that transmits an artificial light. The organic insulation layer disposed over the transparent substrate becomes thinner gradually at a boundary between the transmissive window and the reflective window. The pixel electrode is formed in the transmissive region. The reflective layer is disposed over the organic insulation layer of the reflective window. The light blocking pattern is disposed at the boundary between the transmissive and reflective windows to prevent a light leakage. The switching part is electrically connected to the pixel electrode to apply an image signal to the pixel electrode. Therefore, a light leakage occurring at boundary is prevented by the light blocking pattern.

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application relies for priority upon Korean PatentApplication No.2003-37231 filed on Jun. 10, 2003, the contents of whichare herein incorporated by reference in its entirety.

BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The present invention relates to an array substrate, a method ofmanufacturing the array substrate and a liquid crystal display apparatushaving the array substrate. More particularly, the present inventionrelates to a transmissive and reflective type array substrate forpreventing light leakages, a method of manufacturing the array substrateand a liquid crystal display apparatus having the array substrate.

[0004] 2. Description of the Related Art

[0005] Generally, a photosensitive material for patterning an oxidationlayer, a metal layer, a semiconductor layer, etc. is widely used in aprocess of manufacturing a semiconductor device or a liquid crystaldisplay apparatus.

[0006] The liquid crystal display apparatus includes an array substratehaving a plurality of thin film transistors, a color filter substratehaving a plurality of color filters, and a liquid crystal layerinterposed between the array substrate and the color filter substrate.

[0007] The liquid crystal display apparatus may be classified into atransmissive type liquid crystals display apparatus that displays imagesby using an artificial light, a reflective type liquid crystal displayapparatus that displays images by using an ambient light, and atransmissive and reflective type liquid crystal display apparatus thathas merits of the transmissive type liquid crystal display apparatus andthe reflective type liquid crystal display apparatus.

[0008]FIG. 1 is a schematic cross-sectional view showing a conventionalarray substrate for a transmissive and reflective type liquid crystaldisplay apparatus.

[0009] Referring to FIG. 1, a conventional array substrate for atransmissive and reflective type liquid crystal display apparatusincludes a transparent substrate 10, a data line 20, an organicinsulation layer 30, a pixel electrode 40 and a reflective layer 50. Animage signal is transferred via the data line 20. The organic insulationlayer 30 is formed on the transparent substrate 10, such that theorganic insulation layer 30 defines a reflective region R and atransmissive region T. The pixel electrode 40 is formed on the organicinsulation layer 30, and the pixel electrode 40 receives the imagesignal. The reflective layer 50 is formed on the pixel electrode 40 oron the organic insulation layer 30 to reflect an ambient light.

[0010] The organic insulation layer 30 is formed in the reflectiveregion R, but not formed in the transmissive region T. Therefore, alight Al generated from a backlight passes through the transmissiveregion T, and an ambient light NI is reflected on the reflective layer50. Liquid crystal molecules are disposed over the pixel electrode 40and the reflective layer 50.

[0011] Characteristics of displayed images depend on an arrangement ofthe liquid crystal molecules, and response of the liquid crystalmolecules are changed in accordance with electric fields that areapplied to the liquid crystal molecules. Therefore, a process ofmanufacturing the liquid crystal display apparatus includes an alignmentprocess for uniform alignment of liquid crystal molecules.

[0012] The alignment process includes a coating process for coating analignment film, and a rubbing process for aligning the liquid crystalmolecules according to a pretilt angle. When the rubbing process is notuniform throughout the alignment film, the alignment of the liquidcrystal molecules is irregular to induce a locally irregular arrangementof the liquid crystal molecules. In case of the transmissive andreflective type liquid crystal display apparatus, above describedproblems become more serious.

[0013] As shown in FIG. 1, liquid crystal molecules are arranged inaccordance with a rubbing direction Rd, such that the liquid crystalmolecules form a pretilt angle. However, even when rubbing grooves areuniformly formed via the rubbing process, the pretilt angle of first andsecond inclined portions (or boundary regions) ‘A’ and ‘B’ is notuniform. That is, liquid crystal molecules of the reflective region Rand the transmissive region T maintain a uniform pretilt angle, butpretilt angle of liquid crystal molecules disposed in the first andsecond inclined portions ‘A’ and ‘B’ is not identical with the uniformpretilt angle due to an inclination. As a result, a light generated froma backlight assembly leaks through the first and second inclinedportions ‘A’ and ‘B’ to induce an inferiority of a display quality.

[0014]FIG. 2 is a schematic plan view of the conventional transmissiveand reflective type liquid crystal display apparatus showing a lightleakage caused by an abnormal pretilt angle. In FIG. 2, rectangularshape that is not hatched represents the transmissive region ‘T’ of FIG.1, and ‘CNT’ represents a contact hole through which drain electrode ofa switching device and a pixel electrode are electrically connected toeach other.

[0015] As explained above, a light leaks through a boundary region ‘E’of the transmissive region ‘T’ and the reflective region ‘R’.Especially, the light leaks much at the boundary region ‘E’ between thereflective region and the transmissive region arranged in that sequencealong a rubbing direction Rd.

[0016] Furthermore, when the transmissive and reflective type liquidcrystal display panel is used as a touch screen panel, a display defectcaused by moisture may occur as well as the light leakage. When thetouch screen panel is compressed, electric fields of the boundary regionbecomes unstable to induce an abnormal arrangement of the liquid crystalmolecules. Therefore, a fatal light leakage occurs, so that anafterimage remains at the boundary region and moisture gathers at thesurface of the touch screen panel.

[0017] As described above, the light leakage caused by an abnormalarrangement of liquid crystal molecules disposed in a boundary regionbetween a reflective region and a transmissive region comes out asproblems.

SUMMARY OF THE INVENTION

[0018] The present invention provides an array substrate for preventinga light leakage that occurs at a boundary region between a transmissiveregion and a reflective region.

[0019] The present invention also provides a method of manufacturing thearray substrate.

[0020] The present invention also further provides a liquid crystaldisplay apparatus having the array substrate.

[0021] In an exemplary array substrate according to the invention, thearray substrate includes a transparent substrate, an organic insulationlayer, a pixel electrode, a reflective layer, a light blocking patternand a switching part. The transparent substrate includes a reflectivewindow that reflects an ambient light and a transmissive window thattransmits an artificial light. The organic insulation layer is disposedover the transparent substrate. The organic insulation layer becomesthinner gradually at a boundary between the transmissive window and thereflective window. The pixel electrode is formed in the transmissiveregion. The reflective layer is disposed over the organic insulationlayer of the reflective window. The light blocking pattern is disposedat the boundary between the transmissive window and the reflectivewindow to prevent a light leakage. The switching part is electricallyconnected to a gate line, a source line and the pixel electrode to applyan image signal to the pixel electrode.

[0022] In an exemplary method of forming an array substrate, a firstthin film is formed on a transparent substrate. The first thin film ispatterned to form a gate line, a gate electrode protruded from the gateline and a light blocking pattern. A gate insulation layer and asemiconductor layer are formed on the transparent substrate having thelight blocking pattern. A second thin film is formed on thesemiconductor layer. The second thin film is patterned to form a sourceline, a source electrode protruded from the source line and a drainelectrode that is spaced apart from the source electrode. The gate,source and drain electrodes forms a switching device. An organicinsulation layer is coated on the transparent substrate having theswitching device formed thereon, and a portion of the organic insulationlayer is removed to form a contact hole through which the drainelectrode is exposed, and a transmissive window such that a side portionof the transmissive window overlaps with the light blocking pattern. Apixel electrode that is electrically connected to the drain electrodevia the contact hole is formed over the organic insulation layer. Then,a reflective layer is formed over the organic insulation layer to form areflective window.

[0023] In an exemplary liquid crystal display apparatus according to theinvention, the liquid crystal display apparatus includes an uppersubstrate, a lower substrate and a liquid crystal layer. The uppersubstrate has a color filter. The lower substrate faces the uppersubstrate, and the lower substrate includes a pixel portion, an organicinsulation layer and a light blocking pattern. The pixel portion has areflective window that reflects an ambient light and a transmissivewindow that transmits an artificial light. The organic insulation layerhas an inclined portion that is disposed at a boundary of the reflectivewindow and the transmissive window. The light blocking pattern isdisposed at the boundary to intercept a portion of the artificial lightthat leaks from the boundary. The liquid crystal layer is interposedbetween the upper substrate and the lower substrate.

[0024] According to the present invention, a light leakage at theboundary of the reflective window and the transmissive window isprevented to improve a display quality.

BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The above and other features and advantage points of the presentinvention will become more apparent by describing in detailed exemplaryembodiments thereof with reference to the accompanying drawings, inwhich:

[0026]FIG. 1 is a schematic cross-sectional view showing a conventionalarray substrate for a transmissive and reflective type liquid crystaldisplay apparatus;

[0027]FIG. 2 is a schematic plan view of the conventional transmissiveand reflective type liquid crystal display apparatus showing a lightleakage caused by an abnormal pretilt angle.

[0028]FIG. 3 is a schematic cross-sectional view showing an arraysubstrate of a transmissive and reflective type liquid crystal displayapparatus according to an exemplary embodiment of the present invention;

[0029]FIG. 4 is a plan view showing a transmissive and reflective typeliquid crystal display apparatus according to a first exemplaryembodiment of the present invention;

[0030]FIG. 5 is a cross-sectional view taken along a line A-A′ of FIG.4;

[0031]FIGS. 6A to 6D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 4;

[0032]FIG. 7 is a plan view showing an array substrate of a transmissiveand reflective type liquid crystal display apparatus according to asecond exemplary embodiment of the present invention;

[0033]FIG. 8 is a cross-sectional view taken along a line B-B′ of FIG.7;

[0034]FIGS. 9A to 9D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 7;

[0035]FIG. 10 is a plan view showing a transmissive and reflective typeliquid crystal display apparatus according to a third exemplaryembodiment of the present invention;

[0036]FIG. 11 is a cross-sectional view taken along a line C-C′ of FIG.10;

[0037]FIGS. 12A to 12D are layouts showing a process of manufacturingthe transmissive and reflective type liquid crystal display apparatus ofFIG. 10;

[0038]FIG. 13 is a plan view showing a transmissive and reflective typeliquid crystal display apparatus according to a fourth exemplaryembodiment of the present invention; and

[0039]FIG. 14 is a cross-sectional view taken along a line D-D′ of FIG.13.

DESCRIPTION OF PREFERRED EMBODIMENTS

[0040] Hereinafter the preferred embodiments of the present inventionwill be described in detail with reference to the accompanied drawings.

[0041]FIG. 3 is a schematic cross-sectional view showing an arraysubstrate of a transmissive and reflective type liquid crystal displayapparatus according to an exemplary embodiment of the present invention.

[0042] Referring to FIG. 3, an array substrate of a transmissive andreflective type liquid crystal display apparatus according to anexemplary embodiment of the present invention includes a transparentsubstrate 110 having a pixel portion and a switching portion, a datawiring 120 for transferring a pixel signal to the switching portion (notshown), an organic insulation layer 130 for defining a reflective region‘R’ and a transmissive region ‘T’, a pixel electrode 140 receiving thepixel signal from the switching portion, and a reflective layer 150formed on the pixel electrode 140 and the organic insulation layer 130.

[0043] The pixel portion is a minimum unit for displaying an image, andthe pixel portion includes the reflective region ‘R’ where an ambientlight NI is reflected and the transmissive region ‘T’ where a lightgenerated from a backlight assembly is transmitted. The switching devicecontrols the pixel signal that is to be applied to the pixel electrode.A light blocking pattern 112 is formed on the transparent substrate 110.An insulation layer 114 is formed on the transparent substrate 110having the light blocking pattern 112 formed thereon, such that theinsulation layer 114 covers the transparent 110 and the light blockingpattern 112.

[0044] The organic insulation layer 130 has a column shape having apredetermined width and height. A portion of the organic insulationlayer 130 is removed to form a transmissive window corresponding to thetransmissive region ‘T’. The pixel electrode 150 is formed on theorganic insulation layer 130, and the reflective electrode 150 is formedon the pixel electrode 150 of the reflective region ‘R’. The organicinsulation layer of first and second boundary regions ‘A’ and ‘B’ areinclined. The first boundary region ‘A’ corresponds to a region disposedbetween the reflective region ‘R’ and the transmissive region ‘T’arranged in that sequence along a rubbing direction Rd, and the secondboundary region ‘B’ corresponds to a region disposed between thetransmissive region ‘T’ and the reflective region ‘R’ arranged in thatsequence along the rubbing direction Rd. When a rubbing process iscompleted, liquid crystal molecules 160 are arranged toward the rubbingdirection forming a pretilt angle with respect to the pixel electrode140 and the reflective layer 150. Therefore, liquid crystal molecules ofthe first boundary region ‘A’ lie with respect to the transparentsubstrate 110, and the liquid crystal molecules of the second boundaryregion ‘B’ erect with respect to the transparent substrate 110.

[0045] The pixel electrode 140 is transparent, so that the light Algenerated from the backlight assembly may pass through the pixelelectrode 140 to advance toward upper substrate (not shown). The ambientlight NI arrives at the reflective layer 150 from the upper substrate,and reflected on the reflective layer 150 to advance toward the uppersubstrate.

[0046] For example, the light blocking pattern 112 covers an orthogonalprojection of the first boundary region ‘A’. The light blocking pattern112 may be extended toward the transmissive region ‘T’, such that thelight blocking pattern 112 invades the transmissive region ‘T’.Therefore, the light generated from the backlight assembly that is topass through the first boundary region ‘A’ is blocked by the lightblocking pattern 112 to prevent a light leakage.

[0047] The light blocking pattern 112 may be formed to cover anorthogonal projection of the second boundary region ‘B’. Therefore, alight leakage occurring at the second boundary region ‘B’ is prevented.When the rubbing direction is reversed, the pretilt angle is changed inaccordance with the rubbing direction. In FIG. 3, the organic insulationlayer 130 is not formed in the transmissive region ‘T’. However, theorganic insulation layer 130 may be formed in the transmissive region‘T’ to have a thickness that is thinner than the organic insulationlayer 130 of the reflective region ‘R’. In FIG. 3, the first and secondboundary regions ‘A’ and ‘B’ is not vertical. However, even when thefirst and second boundary regions ‘A’ and ‘B’ are vertical, a lightleakage occurs. Therefore, the light blocking layer 130 may be formed inthe first and second boundary regions ‘A’ and ‘B’.

[0048]FIG. 4 is a plan view showing a transmissive and reflective typeliquid crystal display apparatus according to a first exemplaryembodiment of the present invention.

[0049] Referring to FIG. 4, a liquid crystal display apparatus accordingto a first exemplary embodiment of the present invention includes aplurality of gate lines 209, a plurality of source lines 217, a thinfilm transistor TFT as switching device, a storage capacitor CST, alight blocking pattern 230, a pixel electrode 250, a reflective layer260 formed in a reflective region. The reflective layer 260 definesreflective and transmissive regions.

[0050] The gate lines 209 are formed on a transparent substrate. Thegate lines 209 are extended in a horizontal direction, and the gatelines 209 are arranged in a vertical direction. The source lines 217 areextended in the vertical direction, and the gate lines 209 are arrangedin the horizontal direction. Therefore, neighboring gate lines 209 andneighboring source lines 217 define a pixel region. The pixel regionincludes a thin film transistor TFT and a storage capacitor CST. Thepixel region includes a transmissive region 245 and a reflective region.A light generated from a backlight assembly (not shown) passes throughthe transmissive region 245, and an ambient light is reflected on thereflective region. For example, the transmissive region 245 has arectangular shape, and arranged in parallel with the source lines 217.The transmissive region 245 has a first side portion 245 a, a secondside portion 245 b facing the first side portion 245 a, a third sideportion 245 c and a fourth side portion 245 d facing the third sideportion 245 c. The first and second side portions 245 a and 245 b aredisposed at first and second boundaries ‘A’ and ‘B’, respectively. Thefirst boundary ‘A’ corresponds to a region between the reflective regionand the transmissive region 245 in that sequence along the rubbingdirection Rd. The second boundary ‘B’ corresponds to a region betweenthe transmissive region 245 and the reflective region in that sequencealong the rubbing direction Rd. The third and fourth side portions 245 cand 245 d are substantially parallel with the gate lines 209. The thinfilm transistor TFT includes a gate electrode line 210 protruded fromthe gate lines 209, a source electrode line 218 protruded from thesource lines 217, and a drain electrode line 219 that is spaced apartfrom the source electrode line 218.

[0051] The storage capacitor CST is defined by a first storage electrodeline 220 and a second storage electrode line 222 that is formed via aprocess of forming the source electrode lines 217.

[0052] The light blocking pattern 230 is formed via a process of formingthe gate lines 209, such that a length of the light blocking pattern 230is larger than a length of the first side portion 245 a of thetransmissive region 245, and a width of the light blocking pattern 230is wider than a width of the source lines 217.

[0053] The pixel electrode 250 comprises an optically transparent andelectrically conductive material, for example, such as indium tin oxide(ITO), indium zinc oxide (IZO), etc. The pixel electrode 250 is formedin the pixel region that is defined by the neighboring gate lines andneighboring source lines. The pixel electrode 250 is electricallyconnected to the drain electrode line 219 via the contact hole 243, sothat a pixel voltage is applied to the pixel electrode 250 via the drainelectrode line 219.

[0054] The reflective layer 260 is formed on the pixel electrode 250 toform a reflective region (or reflective window). A portion of thereflective layer 260 is removed to form the transmissive region (ortransmissive window) 245 through which a light generated from abacklight assembly passes. A portion of the light blocking pattern 230is exposed via the transmissive region 245. That is, the portion of thelight blocking pattern 230 invades the first side portion 245 a of thetransmissive region 245 to prevent a light leakage of the first sideportion 245 a of the transmissive region 245.

[0055] For example, when the rubbing direction Rd is from a left side toa right side, as shown in FIG. 4, a first amount of light leaks throughthe first side portion 245 a of the transmissive region 245, and asecond amount of light leaks through the second side portion 245 b incase of a conventional array substrate. The first amount of light ismore than the second amount of light. However, when the light blockinglayer is formed, a light leakage is prevented. The light blocking layermay be formed at both of the first and second side portions 245 a and245 b to prevent the light leakages that occur at the first and secondside portions 245 a and 245 b. The light blocking layer may be formedonly at the first side portion 245 a in order to increase an apertureratio.

[0056] For example, when the rubbing direction is from lower side toupper side of FIG. 4, the light blocking pattern may be formed at thefourth side portion 245 d of the transmissive region. Further, when therubbing direction is from the upper side to lower side of FIG. 4, thegate lines 209 is broaden to the third side portion 245 c to form thelight blocking layer.

[0057] Further, when the rubbing direction corresponds to one or twoo'clock direction, a light blocking pattern may be formed at the firstand fourth side portions 245 a and 245 d. When the rubbing directioncorresponds to 10 or 11 o'clock direction, a light blocking pattern maybe formed at the second and third side portions 245 b and 245 c.

[0058] In the present embodiment, an array substrate having a top ITOstructure, in which the pixel electrodes comprising indium tin oxide(ITO) is formed on the organic insulation layer, is employed in order toexplain the present embodiment. However, the present embodiment may beapplied to a bottom ITO structure, in which the pixel electrodes isformed under the organic insulation layer.

[0059] Further, the reflective layer is formed on the pixel electrode inthe present embodiment. However, the pixel electrode may be formed onthe reflective layer.

[0060]FIG. 5 is a cross-sectional view taken along a line A-A′ of FIG.4. A light blocking pattern is extended from the gate line to overlapwith both first and second side portions 245 a and 245 b.

[0061] Referring to FIG. 5, a transmissive and reflective type liquidcrystal display apparatus according to a first exemplary embodiment ofthe present invention includes an array substrate, a color filtersubstrate 270 and a liquid crystal layer 280 interposed between thearray substrate and the color filter substrate 270.

[0062] The array substrate includes a thin film transistor TFT, astorage capacitor CST and an organic insulation layer 242. The thin filmtransistor TFT includes a gate electrode 210, a semiconductor layer 214,an ohmic contact layer 216, a source electrode 218 and a drain electrode219. The gate electrode 210 is extended from a gate line 209 formed on atransparent substrate 205. A gate insulation layer 212 is formed on thegate electrode 210 and the transparent substrate 205.

[0063] The storage capacitor CST includes a first storage electrode line220 and a second storage electrode line 222. The first storage electrodeline 220 is formed on the transparent substrate 205, such that the firststorage electrode line 220 is spaced apart from the thin film transistorTFT. The second storage electrode line 222 is formed over the firststorage electrode line 220.

[0064] The organic insulation layer 242 is covers the thin filmtransistor TFT and the storage capacitor CST. A portion of the organicinsulation layer 242 is removed to expose a portion of the drainelectrode 219. A plurality of grooves or recesses may be formed on anupper surface of the organic insulation layer 242.

[0065] Additionally, the array substrate includes a light blockingpattern 230 and a source line 217. The light blocking pattern 230 isextended from the gate line 209. The source line 217 is formed over thelight blocking pattern 230. A length of the light blocking pattern 230is larger than a length of the first side portion 245 a of atransmissive window, and a width of the light blocking pattern 230 islarger than a width of the source line 217.

[0066] The array substrate also includes a pixel electrode 250, aninsulation layer 252 and a reflective layer 260. The pixel electrode 250is electrically connected to the drain electrode 219 via a contact hole243. The insulation layer 252 covers the thin film transistor TFT. Thereflective layer 260 is formed on the insulation layer 252, and thereflective layer 260 reflects a light. Therefore, a region, where theorganic insulation layer 242 and the reflective layer 260 are formed,corresponds to a reflective region (or reflective window) 246, and aregion, where the organic insulation layer 242 is not formed,corresponds to a transmissive region (or transmissive window) 245.Therefore, the transmissive region 245 includes only the pixel electrode250 and the insulation layer 252, not the reflective layer 260. A widthof the light blocking pattern 230 is larger than a width of the sourceline 217. Therefore, the light blocking pattern 230 overlaps with thefirst and second side portions 245 a and 245 b of neighboringtransmissive windows, by a length ‘L’, respectively. That is, the lightblocking pattern 230 overlaps with first and second regions ‘A’ and ‘B’of FIG. 4 to prevent a light leakage that occurs at the first and secondregions ‘A’ and ‘B’.

[0067] The pixel electrode 250 comprises an optically transparent andelectrically conductive material, for example, such as indium tin oxide(ITO), tin oxide (TO), indium zinc oxide (IZO), etc.

[0068] In the present embodiment, the insulation layer 252 is interposedbetween the pixel electrode 250 and the reflective layer 260 toelectrically insulate the pixel electrode 250 from the reflective layer260. However, the reflective layer 260 may be formed on the pixelelectrode 250.

[0069] The color filter substrate 270 includes a black matrix (notshown), a color filter layer 274 having R, G, B color filters and aprotection layer (not shown). The black matrix defines R, G, B pixelregions. The R, G, B color filters of the color filter layer 274 areformed in the R, G, B pixel regions, respectively. The protection layerprotects the black matrix and the color filter layer 274. The R, G, Bcolor filters may overlap to form the black matrix instead of formingseparate black matrix. A common electrode (not shown) may be formed onthe protection layer.

[0070] The liquid crystal layer 280 transmits an ambient light or alight that has passed through the transmissive window in accordance witha pixel voltage applied to the pixel electrode 250 and a referencevoltage applied to the common electrode.

[0071] The liquid crystal layer 280 includes a first liquid crystallayer, a second liquid crystal layer and a third liquid crystal layer.The first liquid crystal layer corresponds to a liquid crystal layer 280of the contact hole 243 region, and the first liquid crystal layer has afirst cell gap d1. The second liquid crystal layer corresponds to aliquid crystal layer 280 disposed over the organic insulation layer 242,and the second liquid crystal layer has a second cell gap d2. The thirdliquid crystal layer corresponds to a liquid crystal layer 280 of thetransmissive window 245, and the third liquid crystal layer has a thirdcell gap d3. For example, the second cell gap d2 is no larger than thefirst cell gap d1, and the first cell gap d1 is no larger than the thirdcell gap d3 (d2≦d1≦d3).

[0072] Therefore, when Δn represents a refractivity anisotropy, and ‘d’represents a cell gap, the first liquid crystal layer is characterizedby Δnd1, the second liquid crystal layer is characterized by Δnd2, andthe third liquid crystal layer is characterized by Δnd3.

[0073] Optimal cell gap depends on an optical films disposed under orover the liquid crystal layer 280. However, generally, the second cellgap d2 is less than 1.7 μm, and the third cell gap d3 is less than 3.3μm.

[0074] For example, a twist angle of the liquid crystal layer is about0°. Thus, a rubbing direction of the array substrate is opposite to arubbing direction of the color filter substrate. That is, when a rubbingdirection of the array substrate turns toward right side as shown inFIG. 4, a gate line is diverged to form the light blocking pattern 230,such that the light blocking pattern 230 overlaps with the first sideportion 245 a of the transmissive window 245 through which light leaksmuch.

[0075] When the rubbing direction of the array substrate turns towardleft side, a gate line is diverged to form the light blocking pattern230, such that the light blocking pattern 230 overlaps with the secondside portion 245 b of the transmissive window 245.

[0076] When the rubbing direction of the array substrate turns towardupper side, the light blocking pattern overlaps with the third sideportion 245 c. When the rubbing direction of the array substrate turnstoward lower side, the light blocking pattern overlaps with the fourthside portion 245 d. In order to form the light blocking pattern, thegate line may be diverged. However, a width of the gate line may beincreased to the fourth side portion 245 d to form the light blockingpattern. When the rubbing direction corresponds to two or three o'clockdirection, or ten or eleven o'clock direction, the gate line may bediverged to be overlapped with the first and fourth side portions 245 aand 245 d or second and third side portions 245 b and 245 c.

[0077] Hereinbefore, the pixel electrode 250 is formed on the arraysubstrate and the common electrode is formed on the color filtersubstrate. However, the common electrode may be omitted by applyingdifferent voltage to the array substrate to transmit an ambient light ora light generated from a backlight assembly.

[0078]FIGS. 6A to 6D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 4.

[0079] Referring to FIG. 6A, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on a transparent substrate 205comprising glass or ceramic to form a metal layer. The metal layer ispatterned to form a plurality of gate lines 209, a gate electrode line210, a light blocking pattern 230 and a first storage electrode line220. The gate lines 209 are extended in a horizontal direction, andarranged in a vertical direction. The gate electrode line 210 isprotruded from the gate line 209. The light blocking pattern 230 isprotruded from the gate line 209 to prevent a light leakage. The storageelectrode line 220 is extended in a horizontal direction, so that thestorage electrode line 220 is in parallel with the gate electrode lines209.

[0080] Preferably, a width of the light blocking pattern 230 is largerthan a width of a source line that is to be formed, and a length of thelight blocking pattern 230 is larger than a length of a side portion ofa transmissive window.

[0081] Then, silicon nitride is coated on the substrate having the gateelectrode line 210 is formed thereon to form a gate insulation layer.For example, the silicon nitride may be coated via chemical vapordeposition. An amorphous silicon layer and n+ amorphous silicon layerare formed and patterned to form a semiconductor layer 214 and ohmiccontact layer 216 in sequence. The gate insulation layer may be formedon entire surface of the substrate, or patterned to cover the gate lineand gate electrode line.

[0082] Referring to FIG. 6B, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on the semiconductor layer 214 toform a metal layer. Then, the metal layer is patterned to form aplurality of source lines 217, a source electrode line 218, a drainelectrode line 219, and a second storage electrode line 222. The sourcelines 217 are extended in the vertical direction, and arranged in thehorizontal direction. The source electrode line 218 is protruded fromthe source line 217. The drain electrode line 219 is spaced apart fromthe source electrode line 218. The second storage electrode line 222 isdisposed over the first storage electrode line 220. The first and secondstorage electrode lines 220 and 222 form a storage capacitor CST.

[0083] Referring to FIG. 6C, an organic insulation layer 242 is formedon the semiconductor layer via spin coating method. A portion of theorganic insulation layer 242 is removed to form a contact hole 243 and atransmissive window 245. The contact hole 243 exposes the drainelectrode line 219. A side portion of the transmissive window 245 isdisposed over the light blocking pattern.

[0084] Referring to FIG. 6D, an indium tin oxide layer 250 is formed,such that the indium tin oxide layer 250 is electrically connected tothe drain electrode line 218 via the contact hole 243. The indium tinoxide layer 250 is patterned to form a pixel electrode 250. The indiumtin oxide layer 250 may be formed entirely and patterned to form thepixel electrode (hereinafter, a reference numeral 250 will be representsthe pixel electrode) or the indium tin oxide layer may be formed on aregion of the pixel electrode 250. For example, the pixel electrode 250is spaced apart from the source line 217, but the pixel electrode 250may overlap with the source line 217.

[0085] Then, a reflective layer 260 is formed in a pixel region. Thereflective layer 260 is not formed in the transmissive window 245. Then,an alignment film (not shown) for aligning liquid crystal molecules in arubbing direction is formed.

[0086] For example, the reflective layer 260 is formed to define areflective region. However, the reflective layer 260 partitioned inaccordance with the pixely be formed. That is, the reflective layer maybe formed on a region excluding a portion of a center of the gate line,a portion of a center of the source line and the transmissive region.

[0087] An embossing pattern for enhancing a reflectivity is formed on asurface of the organic insulation layer 242. However, a surface of theorganic insulation layer may be flat.

[0088] Hereinbefore, for example, a transmissive and reflective typeliquid crystal display apparatus having top ITO structure is explained.However, present invention may be applied to a transmissive andreflective type liquid crystal display apparatus having a bottom ITOstructure.

[0089]FIG. 7 is a plan view showing an array substrate of a transmissiveand reflective type liquid crystal display apparatus according to asecond exemplary embodiment of the present invention.

[0090] Referring to FIG. 7, a transmissive and reflective type liquidcrystal display apparatus according to a second exemplary embodiment ofthe present invention includes a plurality of gate lines 209, aplurality of source lines 334, a thin film transistor TFT, a storagecapacitor CST, first and second light blocking patterns 330 and 332, apixel electrode 250 and a reflective layer 260. In FIG. 7, the samereference numerals denote the same elements in FIG. 4, and thus thedetailed descriptions of the same elements will be omitted.

[0091] The first light blocking pattern 330 is spaced apart from thegate line 209. Therefore, the first light blocking pattern correspondsto a floating wiring through which electric signal is not applied. Thefirst light blocking pattern 330 is longer than a side portion of thetransmissive window, which is adjacent and parallel to the source line.A first end portion 330 a of the first light blocking pattern 330invades the transmissive window 345, so that the first end portion 330 aof the first light blocking pattern 330 overlaps with the first sideportion 345 a of the transmissive window 345. The first light blockingpattern 330 also overlaps with the source line 334.

[0092] The second light blocking pattern 332 is spaced apart from thegate line 209, and the second light blocking pattern 332 is longer thana side portion of the transmissive window that is adjacent and parallelto the source line. A first end portion 332 a of the second lightblocking pattern 332 invades a second side portion 345 b of thetransmissive window that is adjacent to the transmissive window thatoverlaps with the first light blocking pattern 330, so that the firstend portion 332 a of the transmissive window overlaps with the secondside portion 345 b of the transmissive window 345. The second lightblocking pattern 332 also overlaps with the source line 334. Therefore,according to the present embodiment, two separate light blockingpatterns are formed to cover the first and second end portions 345 a and345 b, respectively.

[0093] For example, when a rubbing direction turns toward right side, astrong light leakage is prevented by the first light blocking pattern330, and a weak light leakage is prevented by the second light blockingpattern 332. In order to increase an aperture ratio, the second lightblocking pattern 332 may be omitted.

[0094] Hereinbefore, as an example, a transmissive and reflective typeliquid crystal display apparatus having a top ITO structure wasexplained. However, the present embodiment may be employed to atransmissive and reflective type liquid crystal display apparatus havinga bottom ITO structure.

[0095]FIG. 8 is a cross-sectional view taken along a line B-B′ of FIG.7. Reference numeral

[0096] Referring to FIG. 8, a transmissive and reflective type liquidcrystal display apparatus includes an array substrate, a color filtersubstrate 270 and a liquid crystal layer 280 interposed between thearray substrate and the color filter substrate 270. In FIG. 8, the samereference numerals denote the same elements in FIG. 5, and thus thedetailed descriptions of the same elements will be omitted.

[0097] The array substrate includes first and second light blockingpatterns 330 and 332, and a source line 334. The first and second lightblocking patterns 330 and 332 are formed via a process forming the gateline 209. A portion of the source line 334 overlaps with the first andsecond light blocking patterns 330 and 332.

[0098] The first light blocking pattern 330 is spaced apart from thegate line 209, and the first light blocking pattern 330 is longer than afirst side portion 345 a of a first transmissive window 3451. The firstlight blocking pattern 330 overlaps with the first side portion 345 a ofthe first transmissive window 3451 by a first length L1, and the secondlight blocking pattern 332 overlaps with the second side portion 345 bof the second transmissive window 3452 by a second length L2. Therefore,a strong light leakage occurring at a first boundary ‘A’ of an organicinsulation layer 242 disposed at the first side portion 345 a, and aweak light leakage occurring at a second boundary ‘B’ of an organicinsulation layer 242 disposed at the second side portion 345 b areprevented.

[0099] In the second embodiment, a transmissive and reflective typeliquid crystal display apparatus having a top ITO structure is explainedfor example. However, the second embodiment may be employed to atransmissive and reflective type liquid crystal display apparatus havinga bottom type ITO structure.

[0100] Additionally, in the second embodiment, the reflective layer isformed on the pixel electrode. However, the pixel electrode may beformed on the reflective layer.

[0101]FIGS. 9A to 9D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 7.

[0102] Referring to FIG. 9A, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on a transparent substrate 205comprising glass or ceramic to form a metal layer. The metal layer ispatterned to form a plurality of gate lines 209, a gate electrode line210, first and second light blocking patterns 330 and 332, and a firststorage electrode line 220. The gate lines 209 are extended in ahorizontal direction, and arranged in a vertical direction. The gateelectrode line 210 is protruded from the gate line 209. The first andsecond light blocking patterns 330 and 332 are spaced apart from thegate line 209. The storage electrode line 220 is extended in ahorizontal direction, so that the storage electrode line 220 is inparallel with the gate electrode lines 209.

[0103] Preferably, a length of the first and second light blockingpattern 330 and 332 is larger than a length of a side portion of atransmissive window.

[0104] Then, silicon nitride is coated on the substrate having the gateelectrode line 210 is formed thereon to form a gate insulation layer.For example, the silicon nitride may be coated via chemical vapordeposition. An amorphous silicon layer and n+amorphous silicon layer areformed and patterned to form a semiconductor layer 214 and ohmic contactlayer 216 in sequence. The gate insulation layer may be formed on entiresurface of the substrate, or patterned to cover the gate line and gateelectrode line.

[0105] Referring to FIG. 9B, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on the semiconductor layer 214 toform a metal layer. Then, the metal layer is patterned to form aplurality of source lines 334, a source electrode line 218, a drainelectrode line 219, and a second storage electrode line 222. The sourcelines 334 are extended in the vertical direction, and arranged in thehorizontal direction. The source electrode line 218 is protruded fromthe source line 334. The drain electrode line 219 is spaced apart fromthe source electrode line 218. The second storage electrode line 222 isdisposed over the first storage electrode line 220. The first and secondstorage electrode lines 220 and 222 form a storage capacitor CST.

[0106] Referring to FIG. 9C, an organic insulation layer 242 is formedon the semiconductor layer via spin coating method. A portion of theorganic insulation layer 242 is removed to form a contact hole 243 and atransmissive window 345. The contact hole 243 exposes the drainelectrode line 219. A side portion of the transmissive window 345 isdisposed over the light blocking pattern.

[0107] Referring to FIG. 9D, an indium tin oxide layer 250 is formed,such that the indium tin oxide layer 250 is electrically connected tothe drain electrode line 218 via the contact hole 243. The indium tinoxide layer 250 is patterned to form a pixel electrode 250. The indiumtin oxide layer 250 may be formed entirely and patterned to form thepixel electrode (hereinafter, a reference numeral 250 will be representsthe pixel electrode) or the indium tin oxide layer may be formed on aregion of the pixel electrode 250. For example, the pixel electrode 250is spaced apart from the source line 217, but the pixel electrode 250may overlap with the source line 217.

[0108] Then, a reflective layer 260 is formed in a pixel region. Thereflective layer 260 is not formed in the transmissive window 245. Then,an alignment film (not shown) for aligning liquid crystal molecules in arubbing direction is formed.

[0109] A reflective layer 260 is formed on the pixel electrode 250.Additionally, an alignment film (not shown) is formed on the reflectivelayer 260. Then, the array substrate is completed.

[0110]FIG. 10 is a plan view showing a transmissive and reflective typeliquid crystal display apparatus according to a third exemplaryembodiment of the present invention.

[0111] Referring to FIG. 10, a liquid crystal display apparatusaccording to a third exemplary embodiment of the present inventionincludes a plurality of gate electrode 209, a plurality of source line434, a thin film transistor TFT, a storage capacitor CST, a lightblocking pattern 430, a pixel electrode 250 and a reflective layer 260disposed in the reflective region. The reflective layer 260 definesreflective and transmissive regions (or windows). In FIG. 10, the samereference numerals denote the same elements in FIG. 4, and thus thedetailed descriptions of the same elements will be omitted.

[0112] The light blocking pattern 430 is formed via a process of formingthe gate lines 209, such that the light blocking pattern 430 is longerthan a side portion of the reflective windows that is adjacent to thesource lines 434. Additionally, a first end portion 430 a of the lightblocking pattern 430 invades the transmissive window 445, so that thelight blocking pattern 430 overlaps with a first side portion 445 a ofthe transmissive window 445. The light blocking pattern 430 alsooverlaps with the source line 434.

[0113] Therefore, when the rubbing direction turns toward right side ofFIG. 10, the light blocking pattern 430 prevents a light leakage.

[0114] In case that the rubbing direction turns toward upper side ofFIG. 10, the light blocking pattern is formed, such that the lightblocking pattern overlaps with the lower side portion of thetransmissive window 445.

[0115] In case that the rubbing direction turns toward one or twoo'clock direction, the light blocking pattern is formed, such that thelight blocking pattern overlaps with the lower and left side of thetransmissive window 445.

[0116] In case that the rubbing direction turns toward ten or eleveno'clock direction, the light blocking pattern is formed, such that thelight blocking pattern overlaps with the upper and right side of thetransmissive window 445.

[0117] In the present embodiment, an array substrate having a top ITOstructure, in which the pixel electrodes comprising indium tin oxide(ITO) is formed on the organic insulation layer, is employed in order toexplain the present embodiment. However, the present embodiment may beapplied to a bottom ITO structure, in which the pixel electrodes isformed under the organic insulation layer.

[0118] Further, the reflective layer is formed on the pixel electrode inthe present embodiment. However, the pixel electrode may be formed onthe reflective layer.

[0119]FIG. 11 is a cross-sectional view taken along a line C-C′ of FIG.10.

[0120] Referring to FIG. 11, a transmissive and reflective type liquidcrystal display apparatus according to a third exemplary embodiment ofthe present invention includes an array substrate, a color filtersubstrate 270 and a liquid crystal layer 280 interposed between thearray substrate and the color filter substrate 270. In FIG. 11, the samereference numerals denote the same elements in FIG. 5, and thus thedetailed descriptions of the same elements will be omitted.

[0121] The array substrate includes a light blocking pattern 430 and asource line 434. The light blocking pattern 430 is formed via a processof forming a gate line 209, such that the light blocking pattern 430 isspaced apart from the gate line 209 and the light blocking pattern 430is longer than a first side portion 445 a of the transmissive window445. The light blocking pattern 430 overlaps with the first side portion445 a of the transmissive window 445 by a length L. Therefore, a lightleakage occurring at a first boundary A is prevented.

[0122]FIGS. 12A to 12D are layouts showing a process of manufacturingthe transmissive and reflective type liquid crystal display apparatus ofFIG. 10.

[0123] Referring to FIG. 12A, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on a transparent substrate 205comprising glass or ceramic to form a metal layer. The metal layer ispatterned to form a plurality of gate lines 209, a gate electrode line210, a light blocking pattern 430 and a first storage electrode line220. The gate lines 209 are extended in a horizontal direction, andarranged in a vertical direction. The gate electrode line 210 isprotruded from the gate line 209. The light blocking pattern 430 isspaced apart from the gate line 209. The storage electrode line 220 isextended in a horizontal direction, so that the storage electrode line220 is in parallel with the gate electrode lines 209.

[0124] Preferably, a length of the light blocking pattern 230 is largerthan a length of a side portion of a transmissive window.

[0125] Then, silicon nitride is coated on the substrate having the gateelectrode line 210 is formed thereon to form a gate insulation layer.For example, the silicon nitride may be coated via chemical vapordeposition. An amorphous silicon layer and n+amorphous silicon layer areformed and patterned to form a semiconductor layer 214 and ohmic contactlayer 216 in sequence. The gate insulation layer may is be formed onentire surface of the substrate, or patterned to cover the gate line andgate electrode line.

[0126] Referring to FIG. 12B, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on the semiconductor layer 214 toform a metal layer. Then, the metal layer is patterned to form aplurality of source lines 434, a source electrode line 218, a drainelectrode line 219, and a second storage electrode line 222. The sourcelines 434 are extended in the vertical direction, and arranged in thehorizontal direction. The source electrode line 218 is protruded fromthe source line 434. The drain electrode line 219 is spaced apart fromthe source electrode line 218. The second storage electrode line 222 isdisposed over the first storage electrode line 220. The first and secondstorage electrode lines 220 and 222 form a storage capacitor CST.

[0127] Referring to FIG. 12C, an organic insulation layer 242 is formedon the semiconductor layer via spin coating method. A portion of theorganic insulation layer 242 is removed to form a contact hole 243 and atransmissive window 445. The contact hole 243 exposes the drainelectrode line 219. A side portion of the transmissive window 245 isdisposed over the light blocking pattern.

[0128] Referring to FIG. 12D, an indium tin oxide layer 250 is formed,such that the indium tin oxide layer 250 is electrically connected tothe drain electrode line 218 via the contact hole 243. The indium tinoxide layer 250 is patterned to form a pixel electrode 250. The indiumtin oxide layer 250 may be formed entirely and patterned to form thepixel electrode (hereinafter, a reference numeral 250 will be representsthe pixel electrode) or the indium tin oxide layer may be formed on aregion of the pixel electrode 250. For example, the pixel electrode 250is spaced apart from the source line 217, but the pixel electrode 250may overlap with the source line 217.

[0129] Then, a reflective layer 260 is formed in a pixel region. Thereflective layer 260 is not formed in the transmissive window 245. Then,an alignment film (not shown) for aligning liquid crystal molecules in arubbing direction is formed.

[0130] Hereinbefore, the light blocking pattern protruded from the gateline or spaced apart from the gate line, which corresponding to aboundary of the transmissive and reflective regions, prevents a lightleakage. However, except for the gate line, a separate floating wiringmay form the light blocking pattern.

[0131] For example, when a plurality of gate lines and a plurality ofdata lines are formed on a first surface of the substrate, a floatingline corresponding to the boundary region may be formed on a secondsurface of the substrate.

[0132] The light leakage above described is caused by an abnormalarrangement of liquid crystal molecules. Therefore, the light leakagemay be reduced by reducing a pretilt angle with respect to thesubstrate.

[0133] Hereinafter, an array substrate for reducing the pretilt anglewith respect to the substrate will be explained.

[0134]FIG. 13 is a plan view showing a transmissive and reflective typeliquid crystal display apparatus according to a fourth exemplaryembodiment of the present invention.

[0135] Referring to FIG. 13, a liquid crystal display apparatusaccording to a fourth exemplary embodiment of the present inventionincludes a plurality of gate lines 209, a plurality of source lines 334,a thin film transistor TFT, a storage capacitor CST, first and secondlight blocking patterns 330 and 332, a pixel electrode 250 and areflective layer 260 defining reflective and transmissive regions (orwindows). In FIG. 13, the same reference numerals denote the sameelements in FIG. 7, and thus the detailed descriptions of the sameelements will be omitted.

[0136] The reflective layer 260 is formed in the reflective region,which reflects an ambient light. A light generated from a backlightassembly is transmitted through the transmissive region. The lightgenerated from the backlight assembly passes through a gate insulationlayer exposed by removing a portion of an organic insulation layer. Thereflective layer 260 is not formed in the transmissive region, so thatthe reflective layer 260 does not block the light generated from thebacklight assembly. Therefore, the transmissive region corresponds to aregion where the reflective layer 260 is not formed, and the reflectiveregion corresponds to a region where the reflective layer 260 is formed.

[0137] An inclination angle of a first inclined portion that is disposedbetween the reflective region and the transmissive region in thatsequence along the rubbing direction is smaller than an inclinationangle of a second inclined portion that is disposed between thetransmissive region and the reflective region in that sequence along therubbing direction with respect to the substrate. Therefore, liquidcrystal molecules of the first inclined portion, where light leakageoccurs much, resemble liquid crystal molecules of a flat region, leadingto reduce the light leakage.

[0138] For example, when an alignment film is rubbed along the rubbingdirection Rd as shown in FIG. 13, a light leakage of the first sideportion 545 a of the transmissive window 545 is more severe than a lightleakage of the second side portion 545 b of the transmissive window 545.However, according to the present embodiment, the inclination angle ofthe first inclined portion that corresponds to the first side portion545 a is reduced with respect to the substrate, so that the lightleakage is reduced. Additionally, the first light blocking pattern 330prevents the light leakage.

[0139] Furthermore, the second light blocking pattern 332 correspondingto the second side portion 545 b prevents a weak light leakage. Thefirst and second light blocking patterns 330 and 332 may be omitted, oronly the second light blocking pattern 330 and 332 may be omitted inorder to increase an aperture ratio.

[0140]FIG. 14 is a cross-sectional view taken along a line D-D′ of FIG.13.

[0141] Referring to FIG. 14, a transmissive and reflective type liquidcrystal display apparatus includes an array substrate, a color filtersubstrate 270 and a liquid crystal layer interposed between the arraysubstrate and the color filter substrate 270. In FIG. 14, the samereference numerals denote the same elements in FIG. 8, and thus thedetailed descriptions of the same elements will be omitted.

[0142] The array substrate includes first and second light blockingpatterns 330 and 332, and a source line 334. The first and second lightblocking patterns 330 and 332 are formed via a process of forming a gateline 209.

[0143] The first light blocking pattern 330 is spaced apart from thegate line 209, and the first light blocking pattern 330 is longer than afirst side portion 545 a of a first transmissive window 5451. The firstlight blocking pattern 330 is widened, so that the first light blockingpattern 330 overlaps with the first side portion 545 a of the firsttransmissive window 5451 by a predetermined length ‘I’. The second lightblocking pattern 332 is spaced apart from the gate line 209, and thesecond light blocking pattern 332 is longer than a second side portion5456 b of a second transmissive window 5452 that is adjacent to thefirst transmissive window 5451. The second light blocking pattern 332 iswidened, so that the second light blocking pattern 332 overlaps with thesecond side portion 545 b. Therefore, the first light blocking pattern330 prevents a strong light leakage occurring at the first boundary ‘A’of the organic insulation layer 242, which is disposed at the first sideportion 545 a. Additionally, the second light blocking pattern 332prevents a weak light leakage occurring at the second boundary ‘B’ ofthe organic insulation layer 242, which is disposed at the second sideportion 545 b.

[0144] Furthermore, a partial exposure is performed at an upper region‘I’ of the first boundary ‘A’, and both partial exposure and slitexposure are performed at a lower region “II”, so that the inclinationangle of the first boundary ‘A’ becomes smaller than the inclinationangle of the second boundary ‘B’. Therefore, an abnormal arrangement isrelieved to reduce a light leakage.

[0145] In the present embodiment, an array substrate having a top ITOstructure, in which the pixel electrodes comprising indium tin oxide(ITO) is formed on the organic insulation layer, is employed in order toexplain the present embodiment. However, the present embodiment may beapplied to a bottom ITO structure, in which the pixel electrodes isformed under the organic insulation layer.

[0146] Furthermore, in the present embodiment, the reflective layer isformed on the pixel electrode. However, the pixel electrode may beformed on the reflective layer.

[0147] According to the present invention, a light blocking pattern isformed in a boundary of the transmissive region and the reflectiveregion to prevent a light leakage occurring at the boundary.

[0148] Further, an inclination angle of a first inclined portion that isdisposed between the reflective region and the transmissive region inthat sequence along the rubbing direction is smaller than an inclinationangle of a second inclined portion that is disposed between thetransmissive region and the reflective region in that sequence along therubbing direction with respect to the substrate. Therefore, a pretiltangle of liquid crystal molecules of the first inclined portion islarger than a pretilt angle of liquid crystal molecules of the secondinclined portion to reduce a light leakage occurring at the firstinclined portion.

[0149] Having described the exemplary embodiments of the presentinvention and its advantages, it is noted that various changes,substitutions and alterations can be made herein without departing fromthe spirit and scope of the invention as defined by appended claims.

What is claimed is:
 1. An array substrate comprising: a transparentsubstrate including a reflective window that reflects an ambient lightand a transmissive window that transmits an artificial light; an organicinsulation layer disposed over the transparent substrate, the organicinsulation layer being thinner gradually at a boundary between thetransmissive window and the reflective window; a pixel electrode formedin the transmissive region; a reflective layer disposed over the organicinsulation layer of the reflective window; a light blocking patterndisposed at the boundary between the transmissive window and thereflective window to prevent a light leakage; and a switching part thatis electrically connected to a gate line, a source line and the pixelelectrode to apply an image signal to the pixel electrode.
 2. The arraysubstrate of claim 1, further comprising an alignment film rubbed alonga rubbing direction, wherein the organic insulation layer has a firstboundary between the reflective window and the transmissive windowdisposed in that sequence along the rubbing direction, and a secondboundary between the transmissive window and the reflective window inthat sequence along the rubbing direction.
 3. The array substrate ofclaim 2, wherein the light blocking pattern is disposed at the firstboundary.
 4. The array substrate of claim 3, wherein the light blockingpattern is protruded from the gate line along the source line, the lightblocking pattern is longer than a side portion of the transmissivewindow, and the light blocking pattern overlaps with the side portion ofthe transmissive window by a first length.
 5. The array substrate ofclaim 4, wherein the first length is no less than an orthogonalprojection of the first boundary.
 6. The array substrate of claim 3,wherein the light blocking pattern is spaced apart from the gate line,the light blocking pattern is longer than a side portion of thetransmissive window, and the light blocking pattern overlaps with theside portion of the transmissive window by a first length.
 7. The arraysubstrate of claim 6, wherein the first length is no less than anorthogonal projection of the first boundary.
 8. The array substrate ofclaim 3, wherein the second boundary is inclined steeper than the firstboundary.
 9. The array substrate of claim 2, wherein the light blockingpattern is disposed at the first and second boundaries.
 10. The arraysubstrate of claim 9, wherein the light blocking pattern is protrudedfrom the gate line along the source line, the light blocking pattern islonger than a side portion of a first transmissive window and a secondside portion of a second transmissive window adjacent to the firsttransmissive window with the source line interposed therebetween, andthe light blocking pattern overlaps with the first side portion and withsecond side portion.
 11. The array substrate of claim 10, wherein thelight blocking pattern overlaps with the first side portion by a firstlength and with the second side portion by a second length.
 12. Thearray substrate of claim 11, wherein the first length is no less than anorthogonal projection of the first boundary, and the second length is noless than an orthogonal projection of the second boundary.
 13. The arraysubstrate of claim 9, wherein the light blocking pattern includes afirst and second floating wirings spaced apart from the gate line, thefirst and second floating wirings are longer than a side portion of afirst transmissive window and a second side portion of a secondtransmissive window adjacent to the first transmissive window with thesource line interposed therebetween, and the first and second floatingwirings overlap with the first and second side portions, respectively.14. The array substrate of claim 10, wherein the first floating wiringoverlaps with the first side portion by a first length, the secondfloating wiring overlaps with the second side portion by a secondlength, and the first and second floating wirings overlap with thesource line.
 15. The array substrate of claim 11, wherein the firstlength is no less than an orthogonal projection of the first boundary,and the second length is no less than an orthogonal projection of thesecond boundary.
 16. The array substrate of claim 9, wherein the secondboundary is inclined steeper than the first boundary.
 17. The arraysubstrate of claim 1, wherein the organic insulation layer is formed inthe reflective and transmissive windows, the organic insulation layer ofthe reflective window has a first thickness and the organic insulationlayer of the transmissive window has a second thickness that is thinnerthan the first thickness.
 18. The array substrate of claim 1, whereinthe organic insulation layer is formed in the reflective windows. 19.The array substrate of claim 1, wherein the switching part correspondsto a thin film transistor having a gate electrode protruded from thegate line, a source electrode protruded from the source line, and adrain electrode that is spaced apart from the source electrode.
 20. Thearray substrate of claim 9, further comprising a storage capacitorincluding a first storage electrode disposed on the transparentsubstrate such that the first storage electrode is extendedsubstantially parallel with the gate line.
 21. The array substrate ofclaim 9, wherein the gate line and the source line are formed on a firstsurface of the transparent substrate, and the light blocking pattern isformed on a second surface of the transparent substrate such that thelight blocking pattern is substantially parallel with the source line.22. A method of forming an array substrate, comprising: forming a firstthin film on a transparent substrate; patterning the first thin film toform a gate line, a gate electrode protruded from the gate line and alight blocking pattern; forming a gate insulation layer and asemiconductor layer over the transparent substrate having the lightblocking pattern; forming a second thin film on the semiconductor layer;patterning the second thin film to form a source line, a sourceelectrode protruded from the source line and a drain electrode that isspaced apart from the source electrode, the gate, source and drainelectrodes forming a switching device; coating an organic insulationlayer on the transparent substrate having the switching device formedthereon; removing a portion of the organic insulation layer to form acontact hole through which the drain electrode is exposed, and atransmissive window such that a side portion of the transmissive windowoverlaps with the light blocking pattern; forming a pixel electrode thatis electrically connected to the drain electrode via the contact holeover the organic insulation layer; and forming a reflective layer overthe organic insulation layer to form a reflective window.
 23. The methodof claim 22, wherein the light blocking pattern protruded, such that thelight blocking pattern is substantially parallel with the source line.24. The method of claim 23, wherein the portion of the organicinsulation layer is removed to have a first boundary between thereflective window and the transmissive window disposed in that sequencealong a rubbing direction, and a second boundary between thetransmissive window and the reflective window in that sequence along therubbing direction, the first boundary being disposed over the lightblocking pattern and a length of a side portion of the transmissivewindow being shorter than the light blocking pattern, so that the sideportion is screened by the light blocking pattern.
 25. The method ofclaim 24, wherein the second boundary is disposed over the lightblocking pattern.
 26. The method of claim 25, wherein the organicinsulation layer is removed by: exposing firstly the organic insulationlayer to form the contact hole; and exposing secondly the organicinsulation layer to form the transmissive window.
 27. The method ofclaim 26, wherein the transmissive window is formed by: exposingpartially an upper portion of the first boundary; slit exposing a lowerportion of the first boundary; and exposing partially the lower portionof the first boundary.
 28. The method of claim 22, wherein the lightblocking pattern corresponds to a floating line extended substantiallyin parallel with the source line, the floating line being spaced apartfrom the gate line.
 29. The method of claim 28, wherein the portion ofthe organic insulation layer is removed to have a first boundary betweenthe reflective window and the transmissive window disposed in thatsequence along a rubbing direction, and a second boundary between thetransmissive window and the reflective window in that sequence along therubbing direction, the first boundary being disposed over the floatingline and a length of a side portion of the transmissive window beingshorter than the floating line, so that the side portion is screened bythe floating line.
 30. The method of claim 29, wherein the secondboundary is disposed over the floating line.
 31. The method of claim 30,wherein the light blocking pattern includes first and second floatinglines disposed symmetrically with respect to the source line.
 32. Themethod of claim 31, wherein the portion of the organic insulation layeris removed to have a first boundary between the reflective window andthe transmissive window disposed in that sequence along a rubbingdirection, and a second boundary between the transmissive window and thereflective window in that sequence along the rubbing direction, thefirst and second boundaries being disposed over the first and secondfloating lines, respectively and a length of a side portion of thetransmissive window being shorter than the first and second floatinglines.
 33. A liquid crystal display apparatus comprising: an uppersubstrate having a color filter; a lower substrate facing the uppersubstrate, the lower substrate including: a pixel portion having areflective window that reflects an ambient light and a transmissivewindow that transmits an artificial light; an organic insulation layerhaving an inclined portion that is disposed at a boundary of thereflective window and the transmissive window; and a light blockingpattern disposed at the boundary to intercept a portion of theartificial light that is leaked from the boundary; and a liquid crystallayer interposed between the upper substrate and the lower substrate.34. The liquid crystal display apparatus of claim 33, wherein the lowersubstrate further includes a reflective layer disposed on the organicinsulation layer of reflective region and an alignment film that isrubbed to align liquid crystal molecules of the liquid crystal layeralong a rubbing direction, the inclined portion includes a firstboundary between the reflective window and the transmissive windowdisposed in that sequence along a rubbing direction and a secondboundary between the transmissive window and the reflective window inthat sequence along the rubbing direction, and an inclination anglecorresponding to the first boundary is smaller than an inclination anglecorresponding to the second boundary.
 35. The liquid crystal displayapparatus of claim 34, wherein the light blocking pattern is disposedunder the first boundary.
 36. The liquid crystal display apparatus ofclaim 35, wherein the light blocking pattern is protruded substantiallyin parallel with the source line.
 37. The liquid crystal displayapparatus of claim 35, wherein the light blocking pattern corresponds toa floating line extended substantially in parallel with the source lineand spaced apart from the gate line.